Materion Balzers Optics

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USA, Canada

Steffen Capello
+1 303 502 5401
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Optical Coating Technologies – Manufacturing high quality optical coatings requires sophisticated process technology combined with in-depth process know-how

Materion Balzers Optics utilizes several advanced coating technologies for all major thin-film coating types used in the precision optics and photonics industry. A broad range of processes individually optimized for the various coatings and the customer's specific requirements are used for manufacturing of optical components. State-of-the-art facilities with clean room environments together with tailor made cleaning technologies to prepare the surfaces ensure high quality and consistency of the coatings. Spectral photometry and various other inspection methods are used to ensure that all customer specifications and requirements are met.


All these processes are operated by skilled and well trained operating personnel, supervised by experienced engineering staff.

Evaporation

Evaporation (e-beam and boat sources)

  • Highly versatile in materials
  • Flexible in substrate shapes
  • High quality for antireflection coatings
  • High quality for metal coatings
  • Medium quality for demanding dielectric filters

AD Evaporation (Ion Assisted Deposition)

  • Evolution of evaporation technology combining the advantages of evaporation technology with plasma processing
  • High quality precision filter and antireflection coatings
  • Reduced process temperature
  • Low-defect optical coating processes
  • Plasma pretreatment of substrate surface

AD Evaporation
IBS Deposition

IBS Deposition (Ion Beam Sputtering)

  • Highest quality coatings for laser mirrors and filters
  • Very smooth and dense layers with minimum optical loss
  • Very good reproducibility and consistency of coating quality and optical performance

Magnetron Sputter Deposition

  • High quality dielectric filter coatings in volume manufacturing
  • High precision and consistency allowing demanding spectral characteristics with narrow spectral tolerance
  • Excellent spectral stability and durability
  • Optimized for standard sheet substrates
  • Low process temperature <100°C

Magnetron Sputter Deposition
Plasma-Assisted Reactive Magnetron Sputter Deposition

Plasma-Assisted Reactive Magnetron Sputter Deposition

  • Increased process stability, layer thickness accuracy, and index homogeneity compared with the standard Magnetron Sputter Technology
  • Suitable for thicker coatings with up to 30 µm overall physical thickness and 300 layers
  • Minimum physical thickness per layer 3 nm
  • Lowest achievable micro roughness
  • Rapid-prototyping regime applicable for very complex coating designs, too
  • Low surface contamination by load lock concept
  • High environmental stability