Micro-Patterned Interference Filters on Wafer

The spectral response of photodiodes, phototransistors or CMOS sensors can be modified by micro-patterned interference filter coatings. The coatings are applied by photolithographic technology on 2 to 8 inch wafer sizes. Bondpads are kept free. The high positioning accuracy allows several filters to be deposited onto adjacent photodetectors on a die.